Skip to main content

Simple Mathematical Models of High Energy Ion Beam Assisted Deposition Concentration Profiles in Binary Thin Films

Buy Article:

$113.00 plus tax (Refund Policy)

Mathematical models of composed high energy ion beam assisted deposition (IBAD) concentration profiles of implanted component in binary thin films are described. Yields of the backscattered ions and sputtering of the deposited component are considered. A Gaussian probability density is assumed to apply to the ion range distribution. The construction of concentration profiles of various shapes is considered. These profiles should of course be constructed based on continuous changes of the process parameters, but certain technical problems can arise with this continuous parameter changes. Therefore, it has been assumed that the changes to the process parameters are discrete and proceed in several steps. The resulting mathematical models are combinations of error functions. Mathematical models can be used as regression functions for the determination of some parameters, e.g., the sputtering yield. Based on the mathematical model the gradient concentration profile of nitrogen in the SiN x film was experimentally produced by the IBAD method, measured by Rutherford backscattering spectroscopy and compared with the mathematical model.
No Reference information available - sign in for access.
No Citation information available - sign in for access.
No Supplementary Data.
No Data/Media
No Metrics

Keywords: BINARY THIN FILMS; CONCENTRATION PROFILES; HIGH ENERGY IBAD; ION RANGE DISTRIBUTION; MATHEMATICAL MODELS

Document Type: Research Article

Publication date: 2011-10-01

More about this publication?
  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
  • Editorial Board
  • Information for Authors
  • Subscribe to this Title
  • Terms & Conditions
  • Ingenta Connect is not responsible for the content or availability of external websites
  • Access Key
  • Free content
  • Partial Free content
  • New content
  • Open access content
  • Partial Open access content
  • Subscribed content
  • Partial Subscribed content
  • Free trial content
Cookie Policy
X
Cookie Policy
Ingenta Connect website makes use of cookies so as to keep track of data that you have filled in. I am Happy with this Find out more