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A Self-Defined Hollow Needle Formation on Silicon Membranes with the Aids of Carbon Nanotubes

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A self-defined method for the formation of hollow needles and micro-cylindrical structures on silicon substrates is reported which uses the combination of high aspect ratio vertical etching of silicon with a small angle vacuum deposition technique. These structures can be used as the media to transfer gas and liquid through their tiny holes. The fabrication is further continued with the growth of carbon nanotubes on the already created silicon-based features to form a cage-like cylindrical structure. In addition, the growth of vertical carbon nanotubes just inside the cup-like structures has been demonstrated without a need for an extra lithography step.
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Keywords: CARBON NANOTUBES; DEEP REACTIVE ION ETCHING; HOLLOW NEEDLE; SILICON MEMBRANE

Document Type: Research Article

Publication date: 2011-10-01

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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