Influence of Varying Porogen Loads and Different UV Cures on Low- Film Characteristics
Abstract:Nanoporous low-κ films were manufactured by using a 3-step process: co-deposition of a skeleton and porogens by PECVD, porogen removal by remote plasma and UV cure. In this study, the influence of both the variation of the porogen load and the different types of UV-cures on several film characteristics were investigated. Improved κ-values were observed for increased porogen to skeleton ratios and a broad band cure, where the wavelength of the photons is always higher than 200 nm. However the Young's modulus and hardness decreased correspondingly. These variations can be attributed to the changing density and chemical composition of the different films. A wide range of low-κ films was obtained by tuning the porogen load and applying different types of UV cures.
Document Type: Research Article
Publication date: September 1, 2011
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