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Fabrication of Cu x Ge y Nanoplatelets

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Modern technologies demand novel alloy materials for advanced devices and applications. Here we report on Low Pressure Chemical Vapor Deposition (LPCVD) of Ge2Me6 and SnMe4 leading to deposition of nanoplatelets along with nanoparticles. According to analytical techniques (Raman spectroscopy, ED, EDX, SEM and HRTEM) the nanoplatelets up to several tens of μm in length have been prepared in two alloy modifications orthorhombic Cu3Ge and hexagonal Cu86Ge14. Thickness of the nanoplatelets ranges from 50 to 150 nm. CuSn seeds served for the growth of Ge nanoparticles scattered among nanoplatelets.
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Document Type: Research Article

Publication date: 2011-09-01

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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