Decomposition Schemes of Copper(I) N,N′-Diisopropylacetamidinate During Chemical Vapor Deposition of Copper
Authors: Turgambaeva, A.; Prud'homme, N.; Krisyuk, V.; Vahlas, C.
Source: Journal of Nanoscience and Nanotechnology, Volume 11, Number 9, September 2011 , pp. 8198-8201(4)
Publisher: American Scientific Publishers
Abstract:Copper(I) N,N′-diisopropylacetamidinate [Cu(amd)]2 (amd = CH(CH3)2)NC(CH3)NCH(CH3)2), an oxygen and halogen-free compound, was previously tested as precursor for pure copper CVD and ALD films. The present work deals with the investigation of the composition and of the reactivity of the gas phase during the CVD process. The work was performed by mass spectrometry as a function of temperature in two different, though complementary environments: (A) in a miniature, low pressure hot wall CVD reactor, (B) in a cold wall reactor operating at subatmospheric pressure. (A) revealed that the onset of thermal decomposition is 140 °C and 130 °C in vacuum and in the presence of hydrogen, respectively; maximal decomposition degree is reached at temperature higher than 200 °C. The protonated ligand H(amd) is the main gaseous decomposition by-product; propene CH2=CHCH3, acetonitryle CH3C≡N and iminopropane CH3C(CH3)=NH are also observed in vacuum. Heterogeneous decomposition mechanism both in vacuum and hydrogen presence is discussed.
Document Type: Research Article
Publication date: September 1, 2011
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