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Nickel Electroplating for Nanostructure Mold Fabrication

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Abstract:

We demonstrated a practical process of fabricating nickel molds for nanoimprinting. Dual-side polished glass is chosen as the substrate on which nickel nanostructures are successfully electroplated. Photonic crystal structures with 242 nm diameters and other nanoscale pillars down to 9 nm diameters are achieved over a large area. The electroplating parameters are investigated and optimized. This process extends the feasibility of electroplating process to nanoscale and shows great potential in nanoimprint mold fabrication with its low cost, straightforward process and controllable pattern structures.

Keywords: ELECTRON BEAM LITHOGRAPHY; NANOSTRUCTURE; NICKEL ELECTROPLATING

Document Type: Research Article

DOI: https://doi.org/10.1166/jnn.2011.4236

Publication date: 2011-08-01

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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