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Electroforming for Replicating Nanometer-Level Smooth Surface

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Abstract:

We proposed and developed a new electroforming process for the replication of surfaces having nanometer-level smoothness. In the electroforming process, the separation method plays an important role in preventing the degradation of the surface morphology. The key point in this process is the fabrication of a metal film as an electrode on the master surface. Cr atoms are deposited by an arc plasma deposition method and act as a binding material. Subsequently, a nickel film is fabricated by electron beam deposition to form an electrode. Electrodeposition is then carried out in a nickel sulfamate bath. By controlling the density of Cr atoms on the master surface, the binding strength between the nickel film and master surface can be adjusted, which makes it possible to separate the metal film from the master surface smoothly. As a result, a surface roughness of 0.22 nm (root mean square) has been achieved in a 64 m × 48 m area of a replicated surface.

Keywords: ARC PLASMA DEPOSITION; ELASTIC EMISSION MACHINING; ELECTRODEPOSITION; ELECTROFORMING; NANOMETER-LEVEL SMOOTH SURFACE

Document Type: Research Article

DOI: http://dx.doi.org/10.1166/jnn.2011.3889

Publication date: April 1, 2011

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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