Evaluation of Schottky Barrier Diodes Fabricated Directly on Processed 4H-SiC(0001) Surfaces

Authors: Sano, Yasuhisa; Shirasawa, Yuki; Okamoto, Takeshi; Yamauchi, Kazuto

Source: Journal of Nanoscience and Nanotechnology, Volume 11, Number 4, April 2011 , pp. 2809-2813(5)

Publisher: American Scientific Publishers

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Abstract:

Silicon carbide (SiC) is a suitable substrate for low-power-consumption power devices and high-temperature applications. However, this material is difficult to machine because of its hardness and chemical inertness, and many machining methods have been studied intensively in recent years. In this paper, we present a simple method to evaluate the electrical properties of the processed surface using the ideal factor n of a Schottky barrier diode (SBD) fabricated directly on the processed surface. Upon comparing the values of n for SBDs fabricated on a damaged SiC surface and a non-damaged SiC surface, we found that there is a significant difference in the dispersion and magnitude of n. Furthermore, by combining this technique with slope etching, we were able to estimate the thickness of the damaged sub-surface layer.

Keywords: IDEAL FACTOR; SCHOTTKY BARRIER DIODE; SILICON CARBIDE; SUB-SURFACE DAMAGE

Document Type: Research Article

DOI: http://dx.doi.org/10.1166/jnn.2011.3914

Publication date: April 1, 2011

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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