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Low-Rate Sputter-Deposited Fe3Si Thin Films on Si Substrates: Structural and Ferromagnetic Properties

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Fe3Si thin films were sputter-deposited on Si(001) substrates. Structural investigations show that Fe3Si was deposited poly-crystalline with a Si-containing layer at the Fe3Si/Si interface. The formation of the layer was attributed to the influence of low deposition rates used in this study on the grain nucleation in Fe3Si. This layer helps to stabilize the ferromagnetic properties of the subsequent annealed films at 350 °C with 5 Oe obtained for coercive field Hc, ∼920 emu/cm3 for saturation magnetization Ms and ∼0.9Ms for remnant magnetization Mr.


Document Type: Research Article


Publication date: 2011-03-01

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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