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R.F. Magnetron Sputtering of Multilayered c-BN Films on Cemented Carbide Tool

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Abstract:

A c-BN thin film was deposited using a B4C target in a r.f. magnetron sputtering system. The c-BN layer was coated with a TiAlN adhesion layer (∼2 m), boron carbide (∼1 m) and BCN (10∼15 nm) nano-gradient layer system. The c-BN layers with thicknesses of more than 0.5 m were successfully deposited onto cemented carbide substrates. The high resolution XPS spectra analysis of B1s and N1s revealed that the c-BN film was mainly composed of sp3 BN bonds.

Keywords: B4C TARGET; BN BOND; CUBIC BORON NITRIDE; R.F. MAGNETRON SPUTTERING; XPS

Document Type: Research Article

DOI: http://dx.doi.org/10.1166/jnn.2011.3362

Publication date: February 1, 2011

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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