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Effect of Buffer Layer Thickness on the Growth Properties of Hydrothermally Grown ZnO Nanorods

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We investigated the effect of ZnO buffer layer thickness on the growth of hydrothermally grown ZnO nanorods. A series of ZnO buffer layers with different thicknesses was deposited on a p-Si (111) substrate using a co-sputtering system. After annealing the ZnO buffer layer, ZnO nanorods grown were grown hydrothermally at 95 °C. Unlike ZnO nanorods grown on as-deposited ZnO buffer layer, the diameter and length of ZnO nanorods grown on annealed ZnO buffer layers can be controlled. The structural and optical properties of ZnO nanorods grown on annealed ZnO buffer layers were analyzed by field-emission scanning electron microscopy, X-ray diffraction, and photoluminescence. The influence of ZnO buffer layer thickness on ZnO nanorods growth is discussed.
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Keywords: BUFFER LAYER THICKNESS; HYDROTHERMAL PROCESS; ZNO NANOROD

Document Type: Research Article

Publication date: 2011-02-01

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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