Physical Properties and Collapse Force of According to the z-Position of Poly-Si Pattern Using Nano-Tribology
Abstract:Nowadays, many researchers try to measure the collapse force of fine pattern. However, most of the researches use LFM to gauge it indirectly and LFM can measure not for collapse force directly but only limited for horizontal force. Thus, nano-scratch is suggested to measure the collapse force possibly. We used poly-Si pattern on Si plate and changed the z-location of the pattern. From these experiments, the stiffness was decease as depth increase from surface and well fitted with negative exponential curve. Also, the elastic modulus was decreased. From the results, the collapse force of poly-Si nano-patterns was decreased as the depth increased over than 30% from the surface and the maximum collapse force was 26.91 N and pattern was collapsed between poly-Si and plate.
Document Type: Research Article
Publication date: 2011-02-01
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- Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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