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Fabrication and Characterization of Nano-Channel Field Effect Transistors Patterned by AFM Anodic Oxidation

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Abstract:

We report a top-down approach based on atomic force microscope (AFM) local anodic oxidation (LAO) for the fabrications of the nanowire and nano-ribbon field effect transistors (FETs). In order to investigate the transport characteristics of nano-channel, we fabricated simple FET structures with channel width W ∼300 nm (nanowire) and 10 m (nano-ribbon) on 20 nm-thick silicon-on-insulator (SOI) wafers. In order to investigate the transport behavior in the device with different channel geometries, we have performed detailed two-dimensional simulations of nanowire and reference nano-ribbon FETs with a fixed channel length L and thickness t but varying channel width W from 300 nm to 10 m. By evaluating the charge distributions, we have shown that the increase of 'on state' conduction current in SiNW channel is a dominant factor, which consequently result in the improved on/off current ratio of the nanowire FET.

Keywords: AFM; FET; LOCAL ANODIC OXIDATION; NANOWIRE

Document Type: Research Article

DOI: https://doi.org/10.1166/jnn.2011.3389

Publication date: 2011-02-01

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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