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Low Energy Ar+ Ion Beam Irradiation Effects on Si Ripple Pattern

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Abstract:

Etching of surfaces by ion beam sputtering is widely used to pattern surfaces. Recent studies using the high-spatial-resolution capability of the scanning tunneling microscope, atomic force microscope and SEM (Scanning Electron Microscopy) disclose in fact that ion bombardment creates repetitive structures at micro-nanometre scale, waves (ripples), checkerboards or pyramids. The phenomenon is related to the interaction between ion erosion and diffusion of adatoms (vacancies), which causes surface re-organization. In this paper we investigated the ripple pattern formation on Si substrates by low energy Ar+ ion bombardment and the dose effect on ripple size. We also briefly discussed the irradiation effects (at normal incidence) on ripple pattern for different irradiation time. Finally, based on Bradley and Harper (BH) theory we proposed a model to understand the mechanism of ripple pattern change due to Ar+ ion beam irradiation.

Keywords: ATOMIC FORCE MICROSCOPE (AFM); ION BEAM MACHINING; LOW ENERGY ION BEAM; RIPPLE STRUCTURE

Document Type: Research Article

DOI: http://dx.doi.org/10.1166/jnn.2011.3060

Publication date: February 1, 2011

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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