This article reports the effects of nanometer surface roughness on the magnetic properties of CoFeHfO thin films, as deposited on Si (100) substrates. The surface roughness was controlled via the working pressure during the sputtering time. When the working pressure increases from 0.5 to 3 mT, the surface roughness (R) of CoFeHfO thin films, formed by islands with the average high R, increases from 0.25 nm to 4.66 nm, respectively. At surface roughness (R) = 4.66 nm, coercivity (Hc) reaches the highest value of 0.42 Oe and magnetic anisotropy (Hk) drops to the lowest value of 33 Oe. This suggests that the quality of the soft magnetic properties of thin film decrease due to the increase in surface roughness. However, at very low working pressure, thin films become a homogeneous structure which also exhibits poor soft magnetic properties. The optimum value, with Hc of 0.10 Oe and Hk of 50 Oe, were obtained at 1.5 mT of working pressure. The model of the roughness effect on the magnetic properties is introduced and discussed.
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