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Nano-Tribological Properties of Topographically Undulated Nanocrystalline Diamond Patterns

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Abstract:

Surface roughness-controlled nanocrystalline diamond film was fabricated as an undulated line and space pattern on a silicon oxide surface. To simulate a MEMS (Micro-/Electro-Mechanical System) and NEMS (Nano-/Electro-Mechanical System) patterned surface, 800 nm and 1 m wide lines with a 200 nm wide space pattern were prepared on the substrate using E-beam lithography and an ESAND (Electrostatic Self-assembly of NanoDiamond) seeding layer lift-off process. Through this process, an undulated pattern of a nanocrystalline CVD diamond successfully formed by a conventional micro crystalline diamond growth system. The roughness of the deposited surface was controlled by regulating the size of the seeding nanodiamond particles. Crushing of the nanodiamond aggregates and dispersion of the nanodiamond solution was performed in an attrition milling system. An AFM (Atomic Force Microscopy) probe was used for the wear test and surface profiling of nanocrystalline diamond coatings. 2-D friction coefficient mapping by LFM (Lateral Force Microscopy) scanning showed a low friction coefficient (<0.1) on the line-patterned diamond surface, and a higher friction coefficient (<0.3) on a narrow area adjacent to the undulated pattern edges. With prolonged LFM scanning, the high coefficient of friction was reduced to less than 0.1. The bonding status of the nanocrystalline diamond was analyzed with Raman spectroscopy.

Keywords: DIAMOND PATTERNS; LATERAL FORCE NANOCRYSTALLINE; NANO-TRIBOLOGY

Document Type: Research Article

DOI: http://dx.doi.org/10.1166/jnn.2011.3214

Publication date: January 1, 2011

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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