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Monte Carlo Simulation of X-Ray Photoemission Electron Microscopic Image for Ag/Si Nano-Structure

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With the development of the third generation synchrotron radiation sources the X-ray photoemission electron microscopy (XPEEM) is playing as a powerful tool for analyzing specimens with spatial resolution about tens of nanometer. It has been used to observe the chemical reaction process, and to investigate the surfaces, interfaces, thin films, buried layers and nano-structures. XPEEM image signals are contributed from photoelectrons, Auger electrons, backscattering electrons and secondary electrons excited by X-rays of certain energy. In this work, a Monte Carlo model for XPEEM image simulation is built. XPEEM images in total electron yield (TEY) mode are simulated with this model for several nanostructures (spheres and cylinders) of silver deposited on/in a silicon substrate (Ag/Si). The simulated XPEEM image in TEY mode for Ag dot array on a Si substrate is quite close to an experimental image. Furthermore, the XPEEM image simulation has been performed for different incident X-rays and for different geometric structures.
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Document Type: Research Article

Publication date: 2010-11-01

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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