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Fabrication of Regular TiO2 Nanoporous Films Derived by Combining Nanoimprint Technique with Sol–Gel Method

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In this paper, honeycomb-like regular TiO2 nanoporous films deposited on different substrates including ITO glass and silicon wafer are fabricated by combining a nanoimprint technique with a sol–gel method. A novel soft polymer mold containing a thin layer of polymethylmethacrylate and a thicker layer of polydimethylsiloxane, which is obtained from an anodic aluminum oxide template, is carried out for the nanoimprint process. TiO2 precursor solution prepared by the sol–gel processing is used as the nanoimprinted material. After imprinting, the polydimethylsiloxane back layer is easily peeled off before the polymethylmethacrylate mold is chemically removed to avoid any demolding problem. The SEM images show that the honeycomb-like regular nanostructure of the initial anodic aluminum oxide template can be preserved completely on TiO2 via this method, and the XRD results indicate that there is a crystalline transition from amorphous to anatase of TiO2 after 450 °C heat treatment.
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Keywords: NANOIMPRINT; SOL-GEL PROCESSING; TIO2

Document Type: Research Article

Publication date: 2010-11-01

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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