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The Fabrication of Ferromagnetic Nanocontact Structure

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In this paper, we report the fabrication of permalloy nanocontact structures with greatly improved surface and edge smoothness. Magnetic sputtering and thermal evaporation were used for metal film deposition, and lift-off and dry etching techniques were employed for nanocontact structure patterning. The compositional properties of the resulting nanocontacts were investigated using energy dispersive analysis of X-ray (EDAX). Atom force microscope and scanning electron microscope were used for morphological characterisation. We found that high quality permalloy nanocontact structures can be obtained by using the combination of thermal evaporation and lift-off with optimised processing parameters; meanwhile, in the case of depositing metal films using magnetic sputtering, dry etching technique rather than lift-off was used for improved surface morphology of the nanostructures.
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Keywords: MAGNETOELECTRONICS; NANOCONTACT; PERMALLOY

Document Type: Research Article

Publication date: 2010-11-01

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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