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Multiferroic BiFeO3 Thin Films for Multifunctional Devices

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Abstract:

We report the metalorganic chemical vapor deposition of crystalline BiFeO3 films on platinized silicon substrates using n-butylferrocene, triphenylbismuth and oxygen. Based on thermogravimetric analysis data, the suitability of these two precursors for depositing BiFeO3 is discussed. The deposited films were characterized for structure and morphology using X-ray diffraction and scanning electron microscopy. Composition analysis using X-ray photoelectron spectroscopy revealed that the films were stoichiometric BiFeO3. Electrostatic force microscopy indicated that the film had polarizable domains that showed no deterioration in polarization over time long after electric poling. The film showed a saturation magnetization of 10 ± 1 emu/cm3 at room temperature.

Keywords: ANTIFERROMAGNETIC; BISMUTH IRON OXIDE; CHEMICAL VAPOR DEPOSITION; ELECTROSTATIC FORCE MICROSCOPY; FERROELECTRIC; METALLORGANIC PRECURSOR; MULTIFERROIC

Document Type: Research Article

DOI: http://dx.doi.org/10.1166/jnn.2010.2598

Publication date: September 1, 2010

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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