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Periodical Nanostructured Multiline Copper Films Self-Organized by Electrodeposition: Structure and Properties

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Abstract:

Nanoscale patterned electrodeposition of metals on flat substrates has become a topic of great interest both scientifically and technologically in recent years. Here, we demonstrate the self-organized growth of extended arrays of parallel nanoscale copper wires on flat glass chips from an ultra-thin aqueous electrolyte layer. Regular, periodic patterns of copper nanowires with diameters in the range of 40 nm–400 nm were grown, forming parallel arrays of alternating lines of copper and cuprous oxide at periodicities down to approx. 80 nm, depending on the deposition parameters such as voltage and pH. The resulting multiline films are investigated with respect to their structure and electrical properties using Electrical Force Microscopy, Scanning Electron Microscopy and Scanning Auger Electron Spectroscopy. The results of the experiments show a strongly anisotropic behavior of the electrical properties of multiline nanostructures corresponding to their strongly anisotropic geometry.

Keywords: EFM; ELECTROCHEMISTRY; NANOSTRUCTURES; NANOWIRES

Document Type: Research Article

DOI: http://dx.doi.org/10.1166/jnn.2010.2565

Publication date: September 1, 2010

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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