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Fabrication of Mesoporous Cobalt Oxide (Co3O4) Film by Electrochemical Method for Electrochemical Capacitor

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Abstract:

Mesoporous cobalt oxide (Co3O4) films were deposited on ITO coated glass substrates by electrodeposition from an aqueous CoSO4 solution using CTAB (cetyltrimethylammonium bromide) as the templating agent. The structures of the synthesized films were characterized by X-ray diffraction, and X-ray photoelectron spectroscopy. The presence of mesoporosity was confirmed by transmission electron microscopy and small angle X-ray diffraction analyses. The mesoporous structures of the synthesized films were found to be strongly dependent on the deposition conditions, such as deposition voltage, deposition time, temperature and concentration of templating agent. Cyclic voltammetry and discharging curves were used to examine the electrochemical properties as a capacitor. The mesoporous films prepared with CTAB templating showed a much higher specific capacitance and current density than the nonporous electrode prepared without CTAB templating.

Keywords: COBALT OXIDE; CTAB; ELECTROCHEMICAL CAPACITOR; ELECTRODEPOSITION; MESOPOROUS

Document Type: Research Article

DOI: http://dx.doi.org/10.1166/jnn.2010.2318

Publication date: May 1, 2010

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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