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Effects of the Type of Solvents on the Morphology of Styrene-Methacrylic Acid Random Copolymers Cast onto Silicon Wafer

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The effects of the type of solvents on the aggregation behavior of poly(styrene-ran-methacrylic acid) (PSMAA) cast onto silicon wafer were studied using a SEM method. It was found that polystyrene prepared from DMF formed non-spherical aggregates but that PSMAA formed mixtures of ellipsoids and spheres. As the acid content increased, the spheres having a distinct boundary started contacting each other, and the average size of spherical particles decreased. Upon neutralization, the spherical particles became contacted spheres covered with much smaller spheres (ca. 20 nm in their sizes) and formed micro-gels. These results were compared to the data in the previous study of samples obtained from either water or THF. It was observed that the solubility parameters of the copolymers and ionomers, and polarity of solvents were some of key factors that determine the aggregation behavior of the polymers. The volatility of the solvent was also found to be an important factor for the aggregation behavior of polymers.


Document Type: Research Article

DOI: http://dx.doi.org/10.1166/jnn.2010.2243

Publication date: May 1, 2010

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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