Growth of TiO2 Nanorods on a Ta Substrate by Metal-Organic Chemical Vapor Deposition

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Abstract:

TiO2 nanorods were successfully grown on Tantalum (Ta) substrates using titanium tetra isopropoxide (TTIP) as a single precursor without any carriers or bubbling gases. For characterization of the TiO2 structures, scanning electron microscopy (SEM), X-ray diffraction (XRD), and X-ray photoelectron spectroscopy (XPS) were employed. For substrate temperatures below 800 °C, a rough film structure without nanorods could be found. However, at a sample temperature of 800 °C, nanorod structures with a respective diameter and length of 0.1∼0.2 m and 0.7∼1.5 m, respectively, could be synthesized. The nanorods exhibited a rutile phase with a 2:1 stoichiometry of O:Ti, identified using XRD and XPS. When the growth temperature exceeded 800 °C, agglomeration of the nanorods was identified.

Keywords: MOCVD; NANOROD; SURFACE CHARACTERIZATION; TIO2

Document Type: Research Article

DOI: http://dx.doi.org/10.1166/jnn.2010.2305

Publication date: May 1, 2010

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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