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Functional Microscopy Tip Fabrication by an Electric Conductive Nanowire

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The functional microscopy tip was fabricated by an electric conductive nanowire (NW). Single crystalline nickel silicide (NiSi) NW grown by plasma-enhanced chemical vapor deposition has an excellent electrical conductivity. On behalf of the advantages in tiny size and conductivity of NiSi NW, it was utilized as a nanoscale probe. Dielectrophoretic method was applied to position the NW. The NiSi NW containing solution was dropped in an ac electric field applying system to align the NiSi NW on a Si cantilever. The fabricated NiSi NW-sitting functional microscopy tip obtained the information of topography and electrical signals from a nanoscale structure. It shows the high potential of nanoscale microscopy tip fabrication at reduced processing steps.
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Keywords: DIELECTROPHORESIS (DEP); FUNCTIONAL MICROSCOPY TIP; NANOSCALE INFORMATION; NICKEL SILICIDE NANOWIRE (NISI NW); PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD)

Document Type: Research Article

Publication date: 2010-05-01

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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