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Characteristics of Nickel Doped Zinc Oxide Thin Films Prepared by Sputtering

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Abstract:

Nickel-doped zinc oxide thin films were prepared by the magnetron sputtering method. We have studied the structure and optical properties of the samples by using X-ray diffraction (XRD), scanning electron microscopy (SEM), and optical transmittance. The chemical ingredients were examined by energy dispersive X-ray spectroscopy (EDS), and the charge state of Ni ions in the ZnO:Ni films was characterized by X-ray photoelectronic spectrometry (XPS). From the XRD spectra of the samples, it was obvious that there was no second phase, but the doping can disturb the ZnO crystal lattice and change the lattice parameters. All the films prepared have a wurtzite structure and grow mainly along the c-axis orientation. The magnetic measurments showed that the samples exhibit no ferromagnetism above room temperature.

Keywords: DOPING CONCENTRATION; FERROMAGNETISM; OPTICAL PROPERTY; ZNO:NI

Document Type: Research Article

DOI: http://dx.doi.org/10.1166/jnn.2010.2121

Publication date: March 1, 2010

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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