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Selective Growth of Metallic Nanostructures on Surfaces Patterned by AFM Local Anodic Oxidation

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We report on an alternative approach for the fabrication of metallic nanostructures: a selective growth on silicon substrates patterned by local anodic oxidation using atomic force microscopy. Our method represents a maskless, four-step process which combines a top-down and bottom-up approach. The dimensions of both the oxide lines and metallic elements can be controlled during the technological process. In this paper we demonstrate the preparation of gallium and cobalt structures on silicon substrates but this method can be extended to other combinations of metals and substrates enabling thus the fabrication of ordered nanostructures of various compositions and properties on locally oxidized surfaces.
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Document Type: Research Article

Publication date: 01 October 2009

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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