Authors: Lin, K.W.; Wei, M.R.; Guo, J.Y.

Source: Journal of Nanoscience and Nanotechnology, Volume 9, Number 3, March 2009 , pp. 2023-2029(7)

Publisher: American Scientific Publishers

Abstract:

The dependence of the cooling field and the ion-beam bombardment on the exchange bias effects in NiFe/(Ni,Fe)O bilayers were investigated. The positive exchange bias was found in the zero-field-cooled (ZFC) process whereas a negative exchange bias occurred in the FC process. The increased exchange field, H_ex with increasing (Ni,Fe)O thicknesses indicates the thicker the AF (Ni,Fe)O, the stronger the exchange coupling between the NiFe layer and the (Ni,Fe)O layer. In addition, the dependence of the H_ex (ZFC vs. FC) on the (Ni,Fe)O thicknesses reflects the competition between the applied magnetic field and the (Ni,Fe)O surface layer exchange coupled to the NiFe layer. Further, an unusual oscillating exchange bias was observed in NiFe/(Ni,Fe)O bilayers that results from the surface of the (Ni,Fe)O layer being bombarded with different Ar-ion energies using End-Hall deposition voltages (V_EH) from 0 to 150 V. The behavior of the H_ex and the H_c with the V_EH is attributed to the surface spin reorientation that is due to moderate ion-beam bombardment effects on the surface of the (Ni,Fe)O layer. Whether the (Ni,Fe)O antiferromagnetic spins are coupled to the NiFe moments antiferromagnetically or ferromagnetically changes the sign of the exchange bias.

Keywords: EXCHANGE BIAS; ION-BEAM BOMBARDMENT

Document Type: Research article

DOI: http://dx.doi.org/10.1166/jnn.2009.382

Publication date: 2009-03-01

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