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Synthesis of Superhydrophobic Silicon Oxide Nanowires Surface on Silicon Wafer

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High roughness of several hundreds of nanometers and low free energy introduced the superhydrophobic surface with a high water contact angle of ∼160 for the chemically modified silicon oxide nanowires on silicon wafer. Particularly, a very small rolling angle of <5° with the annealed sample was observed. The nano-structure with high roughness and organic perfluoroalkysilane coating with CF2/CF3 groups contributed the superhydrophobicity. The present superhydrophobic nanowires surface on silicon wafer suggests the potential applications in self-cleaning semiconductor devices such as radar surface, solar cell.
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Document Type: Research Article

Publication date: 2009-03-01

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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