Thermal Stability of TiAlN and Nanocomposite TiAlSiN Thin Films
Abstract:TiAlN and TiAlSiN coatings were synthesized by a cathodic arc deposition process. Titanium, Ti50Al50 alloy and AlSi (88 at.% of Al and 12 at.% of Si) alloy targets were adopted as the cathode materials. X-ray diffraction analyses revealed that Ti0.5Al0.5N and Ti49Al0.44Si0.07N possess a B1-NaCl crystal structure. The lattice constants of the Ti0.5Al0.5N and Ti0.49Al0.44Si0.07N calculated from XRD pattern were 0.418 nm and 0.422 nm, respectively. For the high temperature oxidation test, the coated samples were annealed at 900 °C in air atmosphere for 2 hours. In this study, the deposited Ti0.5Al0.5N had completely transformed to TiO2 and Al2O3, and Ti0.49Al0.44Si0.07N remained the as-deposited structure after oxidation treatment. It indicated that Ti0.49Al0.44Si0.07N possesses superior oxidation resistance than Ti0.5Al0.5N, due to the amorphous SiNx phase existed in the nanocomposite structure. The different oxidation mechanisms of Ti50Al50N and Ti0.49Al0.44Si0.07N at high temperature of 900 °C are developed in this study.
Document Type: Research Article
Publication date: 2009-02-01
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