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O-Doped Si2Sb2Te5 Nano-Composite Phase Change Material for Application of Chalcogenide Random Access Memory

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A method to prepare nano-composite phase change material was proposed and demonstrated by oxygen doping into Si2Sb2Te5 material. According to transmission electron microscope images, Si-Sb-Te-rich domains are separated from each other by SiO x -rich domains within the material. A proper dose of O-doping into Si2Sb2Te5 significantly reduces the grain size of the phase change material. Average size of Si-Sb-Te-rich domains is about 10 nm. Such separation will limit the phase-change to a relatively small volume. The reduction of grain size further results in the promotion of data retention and thermal stability of the material. Memory device based on O-doped Si2Sb2Te5 nano-composite phase change material, with a bottom electrode contact of 260 nm in diameter, was fabricated and characterized. The memory cell shows a better electrical performance compared with the Ge2Sb2Te5 based one.
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Keywords: CHALCOGENIDE RANDOM ACCESS MEMORY; COMPOSITE MATERIAL; O-DOPED; PHASE CHANGE; SISBTE

Document Type: Research Article

Publication date: 2009-02-01

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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