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Mechanical Properties of RF Magnetron Sputtering ZnO Thin Film by Nanoindentation

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The mechanical properties of radio frequency (RF) magnetron sputtering epitaxial ZnO thin film on aluminum and diamond substrates were investigated by nanoindentation. Comparing the different substrates, we are able to assess the mechanical properties of the film on nanoindentation response. Though the elastic modulus and hardness values of the film are consistent on different substrates, the experimental results are distributed with a range of E (∼20–55 GPa) and H (∼0.4–2.5 GPa) due to amorphous structure even the indentation depth less than half of film thickness(1 m).


Document Type: Research Article

DOI: http://dx.doi.org/10.1166/jnn.2009.C084

Publication date: February 1, 2009

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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