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Preparation of Phosphorus Doped Hydrogenated Microcrystalline Silicon Thin Films by Inductively Coupled Plasma Chemical Vapor Deposition and Their Characteristics for Solar Cell Applications

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Intrinsic and phosphorus-doped hydrogenated microcrystalline silicon (μc-Si:H) films were prepared using inductively coupled plasma chemical vapor deposition (ICP-CVD) method. Structural, electrical and optical properties of these films were studied as a function of silane concentration, ICP source power and PH3/SiH4 gas ratio. Characterization of these films from Raman spectroscopy and X-ray diffraction revealed that the conductive film exists in microcrystalline phase embedded in an amorphous network. The condition of electrical properties (σ d: ∼10−7 S/cm, σ ph: −10−4 S/cm) and activation energy (0.55 eV), satisfied with properties of intrinsic μc-Si:H, was obtained at 1200 W of ICP power and 2% of silane concentration, respectively. At PH3/SiH4 gas ratio of 0.09%, dark conductivity has a maximum value of ∼18.5 S/cm and optical bandgap also a maximum value of ∼2.39 eV. The deposition rate was not satisfactory (4.9 Å/s) at same condition.
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Document Type: Research Article

Publication date: 2008-10-01

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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