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Selective Photochromic Dye Patterning Using Spiroxazine Compound

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We have studied a selective dye patterning system using light stamping lithography (LSL) method, where the photochromic colorant was applied to confirm the prepared micro patterns. The steps of this process consist of substrate (glass slide) preparation, polydimethylsiloxane (PDMS) transfer and final photochromic dye deposition on the patterns. To determine the designed pattern images, the photochromic spiroxazine compound having rapid color absorption and desirable light fastness properties was selected and synthesized. The resulting deposition characteristics of this spiroxazine dye pattern were characterized using UV-spectrophotometer and image analysis. It is proposed that this selective photochromic dye pattern was obtained by physical and hydrophobic interactions between PDMS mold and spiroxazine molecules. This fabricated spiroxazine dye patterns show a good response with repeated UV light stimuli and visible light on-off test.
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Document Type: Research Article

Publication date: 2008-10-01

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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