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Structural, Electrical, and Optical Properties of Na-Doped ZnO Thin Films Deposited by Pulsed Laser Deposition

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Na-doped ZnO thin films were deposited on quartz substrates at various temperatures by using pulsed laser deposition technique. An X-ray diffractometer and an atomic force microscope were used to investigate the structural and morphological properties of the thin films. A Hall effect measurement system was used to investigate the electrical properties of the thin films. A spectrophotometer was used to measure the transmittances of the thin films. The band gap energies of the thin films were calculated by linear fitting the sharp absorption edge for high-quality thin film. The band gap energies of the Na-doped ZnO thin films are nearly the same as the pure ZnO. A spectrometer was used to investigate the luminescent properties of the thin films. The thin film deposited at 200 °C had no near band edge emission and no deep-level emission. The NBE emission appeared and increased with increasing the growth temperature.
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Document Type: Research Article

Publication date: 2008-10-01

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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