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Comparison of Si Doping Effect on GaN Nanowires and Films Synthesized by Metal-Organic Chemical Vapor Deposition

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Abstract:

We investigated Si doping effect on GaN nanowires and GaN films grown by metal-organic chemical vapor deposition (MOCVD). Si as n-type dopant is incorporated to GaN nanowires and GaN films controlled by SiH4 flow rate (0, 1, 5, 8, and 10 sccm). The charge concentration and mobility of GaN films increased and decreased, respectively, as increasing the SiH4 flow rate, whereas those for GaN nanowires were not influenced by the SiH4 flow rate. Significant vacancies and impurities resulted in the intense yellow band in GaN nanowires as compared with GaN films, which leads to the large device-to-device variation and negligible dependence of Si doping and the SiH4 flux rate on the electrical properties of GaN nanowires.

Keywords: GAN; MOCVD; NANOWIRE

Document Type: Research Article

DOI: http://dx.doi.org/10.1166/jnn.2008.1032

Publication date: October 1, 2008

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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