High Performance Thin Film Transistor with ZnO Channel Layer Deposited by DC Magnetron Sputtering
Authors: Moon, Yeon-Keon; Moon, Dae-Yong; Lee, Sang-Ho; Jeong, Chang-Oh; Park, Jong-Wan
Source: Journal of Nanoscience and Nanotechnology, Volume 8, Number 9, September 2008 , pp. 4557-4560(4)
Publisher: American Scientific Publishers
Abstract:Research in large area electronics,1 especially for low-temperature plastic substrates, focuses commonly on limitations of the semiconductor in thin film transistors (TFTs), in particular its low mobility. ZnO is an emerging example of a semiconductor material for TFTs that can have high mobility, while a-Si and organic semiconductors have low mobility (<1 cm2/Vs).2–5 ZnO-based TFTs have achieved high mobility, along with low-voltage operation low off-state current, and low gate leakage current. In general, ZnO thin films for the channel layer of TFTs are deposited with RF magnetron sputtering methods. On the other hand, we studied ZnO thin films deposited with DC magnetron sputtering for the channel layer of TFTs. After analyzing the basic physical and chemical properties of ZnO thin films, we fabricated a TFT-unit cell using ZnO thin films for the channel layer. The field effect mobility (sat) of 1.8 cm2/Vs and threshold voltage (Vth) of −0.7 V were obtained.
Document Type: Research Article
Publication date: September 1, 2008
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