Authors: Ghatak, J.; Sundaravel, B.; Nair, K.G.M.; Satyam, P.V.

Source: Journal of Nanoscience and Nanotechnology, Volume 8, Number 8, August 2008 , pp. 4318-4321(4)

Publisher: American Scientific Publishers

Abstract:

The high-energy and heavy-ion induced sputtered particles from nanostructures under various conditions can result in variety of size distributions. 1.5 MeV Au²⁺ ions induced sputtering from isolated gold nanostructures deposited on silicon substrate have been studied as a function of incident ion flux (dose rate) and the sputter particle catcher at low temperature. At higher fluxes, a bimodal distribution of the sputtered particles has been observed. Cross-sectional transmission electron microscopy and Rutherford backscattering spectrometry measurements showed that the sputter particle size distribution depends on morphology at surface and interfaces. The results for the size distribution from a catcher at low temperature showed the less agglomeration of ejected clusters on the catcher grids, resulting in the lower-disperse size distribution.

Keywords: SPUTTERED; FLUX; AGGLOMERATION

Document Type: Research article

DOI: http://dx.doi.org/10.1166/jnn.2008.AN56

Publication date: 2008-08-01

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