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MeV Gold Ion Induced Sputtered Nanoparticles from Gold Nanostructures: Dependence of Incident Fluxand Temperature

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The high-energy and heavy-ion induced sputtered particles from nanostructures under various conditions can result in variety of size distributions. 1.5 MeV Au2+ ions induced sputtering from isolated gold nanostructures deposited on silicon substrate have been studied as a function of incident ion flux (dose rate) and the sputter particle catcher at low temperature. At higher fluxes, a bimodal distribution of the sputtered particles has been observed. Cross-sectional transmission electron microscopy and Rutherford backscattering spectrometry measurements showed that the sputter particle size distribution depends on morphology at surface and interfaces. The results for the size distribution from a catcher at low temperature showed the less agglomeration of ejected clusters on the catcher grids, resulting in the lower-disperse size distribution.
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Document Type: Research Article

Publication date: 2008-08-01

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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