MeV Gold Ion Induced Sputtered Nanoparticles from Gold Nanostructures: Dependence of Incident Fluxand Temperature
The high-energy and heavy-ion induced sputtered particles from nanostructures under various conditions can result in variety of size distributions. 1.5 MeV Au2+ ions induced sputtering from isolated gold nanostructures deposited on silicon substrate have been studied as a function of incident ion flux (dose rate) and the sputter particle catcher at low temperature. At higher fluxes, a bimodal distribution of the sputtered particles has been observed. Cross-sectional transmission electron microscopy and Rutherford backscattering spectrometry measurements showed that the sputter particle size distribution depends on morphology at surface and interfaces. The results for the size distribution from a catcher at low temperature showed the less agglomeration of ejected clusters on the catcher grids, resulting in the lower-disperse size distribution.
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Document Type: Research Article
Publication date: 2008-08-01
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