Selective Growth of Vertically Aligned Carbon Nanotubes by Double Plasma Chemical Vapour Deposition Technique
The selective growth of vertically aligned carbon nanotubes (VACNTs) on large area copper substrates was carried out using a double plasma hot-filament chemical vapour deposition system. Three independent power supplies were used to produce two glow discharges within the vacuum reactor.
The generation of two glow discharges and the efficient utilization of the electric fields, by controlling the key process parameters, enabled the production of VACNTs. Morphology, density and structure of carbon nanotubes were characterized using Scanning Electron Microscopy and Raman Spectroscopy.
Keywords: CARBON NANOTUBES; CHEMICAL VAPOUR DEPOSITION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; VERTICAL ALIGNMENT
Document Type: Research Article
Publication date: 01 August 2008
- Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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