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Room Temperature Detachment Nanolithography Using a Rigiflex Polymeric Mold

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Abstract:

We report on detachment nanolithography of an organic thin film at room temperature mediated by ultraviolet (UV) exposure. A nanopatterned, UV curable polyurethane acrylate (PUA) mold was placed on a spin-coated organic film made of 4,4′-bis[N-1-napthyl-N-phenyl-amino]biphenyl (NPB) under a low pressure (1–2 bar). A higher work of adhesion at the organic/mold interface induced detachment of the contacting layer on silicon or gold substrate, resulting in well-defined nanopatterns without a residual layer. The detachment was highly improved by a short-term UV exposure, rendering the film surface free from contaminant hydrocarbons with a lower cohesive force, as confirmed by Fourier transform infrared (FTIR) spectroscopy and measurements of contact angle of water.

Keywords: DETACHMENT; MOLD; NANOLITHOGRAPHY; ROOM TEMPERATURE

Document Type: Short Communication

DOI: http://dx.doi.org/10.1166/jnn.2008.162

Publication date: July 1, 2008

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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