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Nano-Holes in Silicon Wafers Using Laser-Induced Surface Plasmon Polaritons

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Surface Plasmon Polaritons (SPPs) have been explored for a multitude of applications including sub-wavelength lithography, data storage, microscopy and photonics. In this paper, we report the use of SPPs for nanomachining silicon in massively parallel fashion. A Q-switched Nd:YAG laser beam was impinged on gold-thin film deposited, porous alumina membrane (PAM) that contains periodic 2-D array of thousands of nano-holes. The silicon substrate was placed in close proximity with PAM. The formation of SPPs and their coherent interference at the exit of PAM holes created strong nanoscale electrical fields which in turn produced 50–70 nm diameter holes in silicon.
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Keywords: NANO-HOLES; PLASMON; SILICON WAFERS

Document Type: Short Communication

Publication date: 2008-04-01

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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