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Electron Beam Modification of Polymer Nanospheres

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Polystyrene spheres, 500 nm in diameter, self-assembled on the surface of silicon oxide are modified by exposure to an electron beam in a scanning electron microscope. Under electron beam exposure at room temperature, the diameter of the polystyrene spheres decreases by ∼13% following a 9.9 mC/cm2 dose. The shrinkage of the spheres offers a new route for nanosphere lithography where the gaps between the spheres can be accurately tuned. Exposure to electrons also alters the surface chemistry of the spheres, making the spheres much more resistant to oxygen plasma processing.
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Keywords: AFM; LITHOGRAPHY; NANOSPHERES; SEM

Document Type: Research Article

Publication date: 2007-10-01

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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