Electron Beam Modification of Polymer Nanospheres
Polystyrene spheres, 500 nm in diameter, self-assembled on the surface of silicon oxide are modified by exposure to an electron beam in a scanning electron microscope. Under electron beam exposure at room temperature, the diameter of the polystyrene spheres decreases by ∼13% following a 9.9 mC/cm2 dose. The shrinkage of the spheres offers a new route for nanosphere lithography where the gaps between the spheres can be accurately tuned. Exposure to electrons also alters the surface chemistry of the spheres, making the spheres much more resistant to oxygen plasma processing.
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Document Type: Research Article
Publication date: 2007-10-01
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