The functionalization of silicon nanoparticles by thermally induced hydrosilylation in a one-pot process is reported. In contrast to the commonly applied thermally induced hydrosilylation, the process described here is carried out in the presence of hydrofluoric acid as a second phase and therefore proceeds at a lower conversion temperature. The surface functionalization of silicon nanoparticles was analyzed by IR, 13C CPMAS NMR, EELS, and TGA techniques. The applied procedure resulted in functionalized silicon nanoparticles with good chemical and thermal stability.
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