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Structural Characterization of Nanocrystalline Lanthanum Oxyfluoride Films Obtained by Chemical Vapor Deposition

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Abstract:

This study is devoted to a thorough structural and microstructural characterization of nanophasic LaOF-based thin films. The coatings were synthesized by Chemical Vapor Deposition (CVD) onto Si(100) substrates at growth temperatures between 250 and 500 ┬░C, using La(hfa)3┬Ědiglyme (Hhfa = 1,1,1,5,5,5-hexafluoro-2,4-pentanedione; diglyme = bis(2-methoxyethyl)ether) as both La and F molecular source under nitrogen + wet oxygen atmospheres. The system structure and microstructure were investigated by Glancing Incidence X-ray Diffraction (GIXRD) and X-ray microdiffraction. The most relevant sample features, with particular attention to the phase composition as a function of the synthesis conditions, are critically discussed.

Keywords: CHEMICAL VAPOR DEPOSITION (CVD); GLANCING INCIDENCE X-RAY DIFFRACTION (GIXRD); LAOF; NANOCRYSTALLINE THIN FILMS; X-RAY MICRODIFFRACTION

Document Type: Research Article

DOI: http://dx.doi.org/10.1166/jnn.2007.606

Publication date: August 1, 2007

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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