Fabrication of Nanostructure on a Polymer Film Using Atomic Force Microscope
SPM based lithographic techniques have been developed to pattern various substrates such as metals, semiconductors, and organic/polymer films due to its simplicity and high spatial precision nanostructure. Fabrication of nanostructure using polymeric materials is a key technique for the development of nanodevices. Here, we report the fabrication of nanostructures from polyacrylicacid (PAA) and polymethacrylicacid (PMAA) film on a silicon substrate using atomic force microscope (AFM). The formation of the nanopattern from the polymer film was studied using electrostatic nanolithography and the optimization of the conditions for nanopatterning of the polymer film was investigated with respect to the applied potential and translational speed of the AFM tip. The nanostructure of size 28 nm was created using the biased AFM tip on the PMAA film coated on Si(100) substrate and found that this method is a direct and reliable method to produce uniform nanostructures on a polymer film.
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Document Type: Research Article
Publication date: 2007-06-01
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- Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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