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Gold Nanostructuring on Si Substrate by Selective Electroless Deposition

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Gold deposition on Si(111) substrates has been carried out by electroless process from KAuCl4 in a fluorinated solution and the resulting nanostructures have been characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), and scanning electron microscopy (SEM). Deposition carried out under normal plating conditions produces an Au film with (111) orientation. The effect of additives such as poly(vinylpyrrolidone) (PVP) and mercaptoundecanoic acid (MUA) to the plating solution has been examined. While PVP induces amorphous deposition, MUA gives rise to flat (111) oriented islands. In order to produce individual nanostructures, we made use of octadecyltrichlorosilane (OTS) as a masking agent and carried out electroless deposition with an intermittent dip in OTS. By varying the durations of dip in the two solutions, various Au nanostructures—islands, cellular networks, and nanowires are obtained.
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Document Type: Research Article

Publication date: 2007-06-01

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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