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RF Sputter Deposited Nanocrystalline (110) Magnetite Thin Film from α-Fe2O3 Target

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Nanocrystalline magnetite thin film was prepared on to fused quartz substrate by sputtering at an rf power of 50 W. X-ray diffraction study showed that the sputtered film was (110) oriented. The stoichiometry in the thin film has been confirmed through a variety of characterization techniques. The room temperature spontaneous magnetization value (4MS) of the film was 5100 G. This is about 85% of the bulk value. The resistivity of the film showed a sharp change around 120 K, indicative of the Verwey transition.


Document Type: Research Article


Publication date: 2007-06-01

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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