Stacking Nature of the Catalytic Chemical Vapor Deposition-Derived Double-Walled Carbon Nanotubes
Authors: Kim, Yoong-Ahm; Muramatsu, Hiroyuki; Kojima, Masahito; Hayashi, Takuya; Kaburagi, Yutaka; Endo, Morinobu
Source: Journal of Nanoscience and Nanotechnology, Volume 6, Number 11, November 2006 , pp. 3321-3324(4)
Publisher: American Scientific Publishers
Abstract:
Here we described the synthesis of highly pure double walled carbon nanotube (DWNT) through a right combination of a catalytic chemical vapor deposition method and the two-step purification and evaluated their stacking infidelity when compared to multi-walled carbon nanotubes (MWNTs). Easy fabrication of thin and flexible, but mechanically tough DWNT-buckypaper was due to the long and large-sized bundled DWNT (up to 50 nm), where DWNTs with diameter below 2 nm were packed in hexagonal array. Through detailed transmission electron microscope, X-ray and Raman studies, we confirmed that the intershell spacing of our DWNT sample was ca. 0.36 nm, which was believed to strongly affect negative and small magnetoresistance absolute value of −0.09 at 77 K and 1 T.Keywords: CARBON NANOTUBE; STACKING NATURE; RAMAN; MAGNETORESISTANCE
Document Type: Research article
DOI: http://dx.doi.org/10.1166/jnn.2006.001
Publication date: 2006-11-01
- Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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