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Fabrication of Nickel Nanocontacts Using Nanostencils and Electron Beam Assisted SiO2 Deposition

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Abstract:

Nickel nanocontacts for studying ballistic magnetoresistance have been fabricated by sputtering through FIB prepared nanostencil masks and by using electron beam assisted deposition of SiO2 to reduce the size of FIB milled pores through silicon nitride membranes. These two methods are discussed in terms of the nanocontact sizes, fabrication, and yield. The smallest size of the nanocontacts prepared using the nanostencil method was 40 nm and by the filling method was 1–2 nm. The maximum magnetoresistance measured was 1% and no evidence of a large ballistic magnetoresistance was observed.

Keywords: BALLISTIC MAGNETORESISTANCE; ELECTRON BEAM; NANOSTENCILS; NICKEL NANOCONTACTS

Document Type: Research Article

DOI: http://dx.doi.org/10.1166/jnn.2006.535

Publication date: August 1, 2006

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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