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Fabrication and Characterization of Nanopore Array

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A nanopore array with diameter of ∼30 nm was fabricated by use of focused ion beam (FIB) scanning and thin film coating on Si(100). A thin film of SiO2 with thickness of 200 nm (used as sacrificial layer) was coated by physical evaporation deposition (PVD) first. Next, the thin films of Aluminum with thickness of 500 nm were coated on the surface of SiO2 thin film. A window with an area of 2 × 2 mm2 was opened by reactive ion etching from bottom side and reached to the thin film of SiO2. After that, a fine controlled FIB milling with bitmap function (milling according to a designed pattern in a defined area) was used to scan the area. Signal is obtained by a sensor inside the vacuum chamber collecting secondary electrons emitted from the sputtered material when the beam reach the layer of SiO2. Stopping the milling process at this moment, the nanopore array was derived after removing the sacrificial layer by wet chemical etching. The nanopore arrays were characterized using transmission electron microscopy (TEM) after the FIB drilling.


Document Type: Research Article


Publication date: July 1, 2006

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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